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NEC Announces World's First 5GHz SiGe Transistor for Wireless LAN and Mobile Communications


- Offering the world's top-level low-noise/high-gain features -


Tokyo, July 15, 2002

SiGe Transistor
"SiGe Transistor"


NEC Compound Semiconductor Devices, Ltd., today announced the release of a new lineup of silicon germanium transistors (SiGeHBTNote1) ideal for high-frequency amplifier applications used in wireless communications equipment including wireless LAN and mobile communications. Sample shipments will begin immediately.


The new lineup was developed using the company's original SiGeHBT semiconductor process technology to produce the world's top-level high-breakdown-voltage, low-noise and high-gain features. The lineup includes the 5GHz silicon germanium transistor, a world-first product that is ideally suited for use in wireless LAN and offers considerable cost advantages over the currently used high-frequency gallium arsenide transistors (GaAs) due to the abundance of the raw material silicon. In addition, the lineup's breakdown voltage between collector and emitter, the element that controls the operating voltage, has been improved 1.5 times over the company's current products to 5V. This has substantially widened the application range and allowed customers much greater freedom with their circuit designs. To further accommodate customer's design needs, the lineup offers both a low-noise/high-gain type and middle-output type SiGeHBT transistor.


Sample pricing


Product code Features Sample price
(JPY/Unit)
NESG2021M05 low-noise, high-gain, low voltage 30 JPY
NESG2031M05 low-noise, high-gain 30 JPY
NESG2101M05 middle output, low distortion 50 JPY


Availability
Volume production is scheduled for September 2002 at an initial production capacity of 1 million units per month, increasing to 10 million units per month by March 2003.


Recent trends in the use of broadband are prompting serious growth in the wireless device market. Interest in these devices has always been high in the mobile multimedia market, particularly Internet connection devices that use wireless LAN in a mobile environment. And recently, as users have become attracted to the simplicity of the wireless concept, its popularity has spread to new areas such as the home and business. The resulting increase in the amount of information being transmitted has seen the frequency band used in these applications expand rapidly from 2GHz to 5GHz. While this shift has in turn raised the performance level for silicon devices used at these high frequencies, the attempts to improve the high-frequency performance have often resulted in a lower breakdown voltage.
In developing these new products, the company has overcome this problem by employing a technology based on its original UHS2 SiGe self-alignment processNote2 that reduces the parasitic resistance and capacitanceNote3 and controls the breakdown voltage through selective epitaxial base growthNote4 optimization. In this way, the breakdown voltage can be raised while allowing a much wider operating frequency range.


The new lineup is ideal for data communication in the 5GHz range such as wireless LAN and ITS (Intelligent Transport Systems), as well as amplifiers and oscillators in mobile/cordless phones and satellite broadcasting. The superior features of these products also contribute to miniaturization, high performance, and power efficiency in the application sets.
NEC Compound Semiconductor Devices, Ltd. plans to continue satisfying the needs of this market by enhancing its lineup with devices that achieve an even higher performance.


Please refer to the attachment for the major specifications of the new lineup.





Notes:

  *1: SiGeHBT
Silicon germanium heterojunction bipolar transistor
A transistor with excellent high-frequency characteristics realized by a combination of two process technologies: one that improves the characteristics by adding a small amount of germanium to the base layer of a silicon transistor, and one that uses a heterojunction to form high-density paths along which fast-moving electrons pass inside a semiconductor.
  *2: Self alignment
An alignment technology used to automatically correct displacement that may occur during ion implantation or pattern etching on a semiconductor.
  *3: Parasitic resistance/capacitance
The resistance and capacitance of the junction that occurs parasitically in the semiconductor structure that forms a transistor.
  *4: Selective epitaxial base growth
A process technology used to grow crystals in the semiconductor materials that form the base layer of the transistor.




About NEC Corporation


NEC Corporation (NASDAQ: NIPNY) is a leading provider of Internet solutions, dedicated to meeting the specialized needs of its customers in the key computer network and electron device fields through its three market-focused in-house companies: NEC Solutions, NEC Networks and NEC Electron Devices. NEC Corporation, with its in-house companies, employs more than 140,000 people worldwide and saw net sales of approximately $39 billion in fiscal year 2001-2002. For further information, visit the NEC home page at http://www.nec.com/.



Press Contacts:

in Japan
Daniel Mathieson
NEC Corporation
+81-3-3798-6511
E-mail:d-mathieson@bu.jp.nec.com



Information in the press releases, including product prices and specifications is current on the date of the press announcement, but is subject to change without prior notice.


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